i

Title of the course

MM 448 :  Thin Films Lab.

 

ii

Credit structure

L          T          P          C

0           0         1.5        1.5

 

iii

Pre-requisite, if any

None

 

iv

Course content

Understanding of vacuum generation and characterization. Determination of pumping rate of rotary pump, leak rate of vacuum systems. Understanding of various pumps and vacuum gauges. Physical vapor deposition of metallic films: resistive evaporation, electron beam evaporation, DC sputtering. Determination of sheet resistance by 4-probe method.

 

v

Texts/References

L.I. Maissel and R. Glang, Handbook of Thin Film Technology, McGraw-Hill, 1970.

 

S. Dushman and J.M. Laferty, Scientific Foundations of Vacuum Techniques, John Wiley, New York, 1962.

 

S.A. Campbell, The Science and Engineering of Microelectronic fabrication, Oxford University Press, 1996.


 

vi

Instructor(s) name

Prof. R.O.Dusane